Application of high purity indium oxide

High-purity indium oxide is an important new high-tech material with many unique physical and chemical properties. It is an oxide of the rare metal indium with the formula In2O3, also known as indium trioxide. High-purity indium oxide is an N-type transparent semiconductor functional material known for its large band gap, low resistivity, and high catalytic activity. Its application field is very wide, mainly including the following aspects:
In the glass, 陶芸, and chemical fields, high-purity indium oxide can be utilized to produce transparent ceramics, high-temperature ceramics, 電子セラミックス, special optical glass, and high-efficiency catalysts.
Electronics and Photovoltaic Field: High-purity indium oxide is valued for its high transparency and conductivity, making it a common material in field-effect transistors, photoelectric devices, and other electronic devices. Indium tin oxide (伊藤) is used in transparent electrodes, solar cell conductive films, and the manufacturing of other semiconductor materials.
Optical field: High-purity indium oxide has excellent transmittance and low dispersion, making it suitable for manufacturing optical components like optical prisms and lenses. The field of optoelectronics utilizes high-purity indium oxide to manufacture thin-film transistors (TFT) for driving circuits in flat panel displays and LCD TVs.
It is also used to prepare photodiodes (LEDs) and photodetectors for optical communication and photoelectric sensing.