High-purity indium oxide is an important new high-tech material with many unique physical and chemical properties. It is an oxide of the rare metal indium with the formula In2O3, also known as indium trioxide. High-purity indium oxide is an N-type transparent semiconductor functional material known for its large band gap, low resistivity, and high catalytic activity. Its application field is very wide, mainly including the following aspects:
In the glass, 도예, and chemical fields, high-purity indium oxide can be utilized to produce transparent ceramics, high-temperature ceramics, 전자 세라믹, special optical glass, and high-efficiency catalysts.
Electronics and Photovoltaic Field: High-purity indium oxide is valued for its high transparency and conductivity, making it a common material in field-effect transistors, photoelectric devices, and other electronic devices. Indium tin oxide (이토) is used in transparent electrodes, solar cell conductive films, and the manufacturing of other semiconductor materials.
Optical field: High-purity indium oxide has excellent transmittance and low dispersion, making it suitable for manufacturing optical components like optical prisms and lenses. The field of optoelectronics utilizes high-purity indium oxide to manufacture thin-film transistors (TFT) for driving circuits in flat panel displays and LCD TVs.
It is also used to prepare photodiodes (LED 에스테르) and photodetectors for optical communication and photoelectric sensing.
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