High-purity indium oxide is an important new high-tech material with many unique physical and chemical properties. It is an oxide of the rare metal indium with the formula In2O3, also known as indium trioxide. High-purity indium oxide is an N-type transparent semiconductor functional material known for its large band gap, low resistivity, and high catalytic activity. Its application field is very wide, mainly including the following aspects:
1.グラス, 陶芸, and chemical fields, high-purity indium oxide can be utilized for manufacturing transparent ceramics, high-temperature ceramics, 電子セラミックス, special optical glass, and high-efficiency catalysts.
2.In the field of electronics and photovoltaics, high-purity indium oxide is extensively utilized due to its high transparency and conductivity. It is commonly found in field-effect transistors, photoelectric devices, and various other electronic devices. Additionally, 酸化インジウムスズ (伊藤) is used for targets, transparent electrodes, conductive films for solar cells, and in the manufacturing of other semiconductor materials.
3.optical field, high-purity indium oxide exhibits excellent transmittance and low dispersion, making it suitable for manufacturing optical components like prisms and lenses.
4.the field of optoelectronics, high-purity indium oxide can be utilized to manufacture thin-film transistors (TFT) for flat panel displays, LCD TV driver circuits, as well as for the production of photodiodes (LEDs) and photodetectors. These components are essential for optical communication and photoelectric sensing, and other related fields.